Investigation on the simultaneous removal of fluoride, ammonia nitrogen and phosphate from semiconductor wastewater using chemical precipitation-Reference-Cited by-同舟云学术

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Investigation on the simultaneous removal of fluoride, ammonia nitrogen and phosphate from semiconductor wastewater using chemical precipitation

Published:2017-01 Issue: Volume:307 Page:696-706
ISSN:1385-8947
Container-title:Chemical Engineering Journal
language:en
Short-container-title:Chemical Engineering Journal

Author:

Huang Haiming,Liu Jiahui,Zhang Peng,Zhang Dingding,Gao Faming

Funder

National Natural Science Foundation of China

Natural Science Foundation of Hebei Province

Outstanding Young Scholars Project of Colleges and Universities of Hebei province

China Postdoctoral Science Foundation

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference38 articles.

1. Simultaneous reduction of copper and toxicity in semiconductor wastewater using protonated alginate beads;Bang;Chem. Eng. J.,2016

2. Treatment of semiconductor wastewater using single-stage partial nitrification and anammox in a pilot-scale reactor;Liang;J. Taiwan Inst. Chem. Eng.,2016

3. Application of membrane technology on semiconductor wastewater reclamation: a pilot-scale study;Huang;Desalination,2011

4. Advanced treatment of semiconductor wastewater by combined MBR–RO technology;Xiao;Desalination,2014

5. Fluoride removal by induced crystallization using fluorapatite/calcite seed crystals;Deng;Chem. Eng. J.,2016

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