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Investigation of fluoride and silica removal from semiconductor wastewaters with a clean coagulation-ultrafiltration process

  • Published:2022-06 Issue: Volume:438 Page:135562
  • ISSN:1385-8947
  • Container-title:Chemical Engineering Journal
  • language:en
  • Short-container-title:Chemical Engineering Journal

Author:

Qiu Yangbo,Ren Long-Fei,Xia Lei,Shao Jiahui,Zhao Yan,Van der Bruggen Bart

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference58 articles.

1. Technology status and trends of industrial wastewater treatment: A patent analysis;Mao;Chemosphere,2021

2. Investigation on the simultaneous removal of fluoride, ammonia nitrogen and phosphate from semiconductor wastewater using chemical precipitation;Huang;Chem. Eng. J.,2017

3. Combined treatment of polishing wastewater and fluoride-containing wastewater from a semiconductor manufacturer Colloids Surf;Luna;A,2009

4. Fluoride-rich wastewater treatment by ballast-assisted precipitation with the selection of precipitants and discarded or recovered materials as ballast;Lacson;J. Environ. Chem. Eng.,2021

5. Coupled precipitation-ultrafiltration for treatment of high fluoride-content wastewater;Liu;J. Taiwan Inst. Chem. Eng.,2016
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