Vibrational electron energy loss studies of surface processes on Si(111)7×7 and vitreous SiO2 ion-mediated in CF4 and CH2F2
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference40 articles.
1. Surface processes in low pressure plasmas
2. Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHClF2
3. Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
4. Silicon surfaces treated by CF4, CF4/H2, and CF4/O2 rf plasmas: Study by in situ Fourier transform infrared ellipsometry
5. Surface science aspects of etching reactions
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1. Microstructures Formation by Fluorocarbon Barrel Plasma Etching;International Journal of Plasma Science and Engineering;2008-11-21
2. Electron impact dissociation of oxygen-containing molecules–A critical review;Physics Reports;2008-09
3. Fluorine-doped SiO2 and CF low-k dielectrics obtained during RIE process in fluorine plasmas;Vacuum;2008-06
4. Surface Chemistry of Monochlorinated and Dichlorinated Benzenes on Si(100)2×1: Comparison Study of Chlorine Content and Isomeric Effects;The Journal of Physical Chemistry B;2006-04-27
5. Thermal and Ion-Induced Surface Reactions of 1,1-Difluoroethylene on Si(111)7×7 and Vitreous SiO2;The Journal of Physical Chemistry B;2005-07-19
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