Epitaxy: the motion picture-Reference-Cited by-同舟云学术

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Epitaxy: the motion picture

Published:2002-03 Issue:1-3 Volume:500 Page:437-457
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Finnie Paul,Homma Yoshikazu

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference58 articles.

1. Molecular Beam Epitaxy;Cho,1994

2. Molecular Beam Epitaxy: Fundamentals and Current Status;Herman,1996

3. The MOCVD Challenge Volume 1: A Survey of GaInAsP–InP for Photonic and Electronic Applications;Razeghi,1989

4. Gas Source Molecular Beam Epitaxy: Growth and Properties of Phosphorus Containing III–V Heterostructures;Panish,1993

5. S. Entwistle, Trends in the market for GaAs devices, Compound Semiconductor 6, May/June 2000

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1. Mass-Spectrometry Investigation of the Kinetics of the Molecular-Beam Epitaxy of CdTe;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2021-07

2. Nucleation of two-dimensional islands on Si (111) during high-temperature epitaxial growth;Semiconductors;2017-02

3. Atomic steps on an ultraflat Si(111) surface upon sublimation;Semiconductors;2016-05

4. Flexible semiconductor film based on properties poly(o-phenylenediamine) nano ribbon as biologically active substrate;Synthetic Metals;2016-03

5. Molecular Beam Epitaxy: An Overview;Reference Module in Materials Science and Materials Engineering;2016

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