Adsorption of methylsilane on copper surfaces

Author:

Spencer Michelle J.S,Nyberg Graeme L

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. References;Vibrational Spectra of Organometallics;2018-12-07

2. Hydrogen elimination from the dissociation of methyl-substituted silanes on tungsten and tantalum surfaces;Canadian Journal of Chemistry;2016-04

3. Formation of Methyl Radicals from Decomposition of Methyl-Substituted Silanes over Tungsten and Tantalum Filament Surfaces;The Journal of Physical Chemistry A;2013-08-02

4. X-ray photoelectron spectroscopy measurement of the Schottky barrier at the SiC(N)/Cu interface;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-09

5. A RAIRS study of the adsorption and decomposition of methylsilane on Cu(111);Journal of Physics: Condensed Matter;2008-08-01

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