Photolysis of SF6 adsorbed on Si(111)-7 × 7 by monochromatic soft X-ray-Reference-Cited by-同舟云学术

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Photolysis of SF6 adsorbed on Si(111)-7 × 7 by monochromatic soft X-ray

Published:2010-08 Issue:17-18 Volume:604 Page:1494-1501
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Tsai W.-C.,Wang S.-K.,Chou L.-C.,Chen J.,Wu Y.-H.,Chen H.-C.,Wen C.-R.

Funder

National Science Council

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference47 articles.

1. Synchrotron radiation‐excited chemical vapor deposition of SixNyHzfilm

2. Synchrotron radiation‐induced etching of a carbon film in an oxygen gas

3. Synchrotron radiation-excited chemical-vapor deposition and etching

4. Potential of site specific photochemical processing using synchrotron radiation

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Adsorption of formic acid on Si(111)7 × 7 at room temperature: a valence band photoemission and Si2p photodesorption study;Surface and Interface Analysis;2014-11-18

2. Monochromatic soft X-ray-induced reactions of CCl2F2 adsorbed on Si(111)-7×7 near the Si(2p) edge;Surface Science;2012-07

3. Continuous-time photon-stimulated desorption spectroscopy studies on soft x-ray-induced reactions of CF3Br adsorbed on Si(111)-7×7;The Journal of Chemical Physics;2011-10-28

4. Monochromatic soft-x-ray-induced reactions of CF2Cl2adsorbed on Si(111)-7 × 7 studied by continuous-time photon-stimulated desorption spectroscopy near the F(1s) edge;Journal of Physics: Condensed Matter;2011-10-13

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