Secondary ion formation/survival during the initial stages of sputtering Si and SiO2 with Cs+
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference42 articles.
1. Fundamental Processes of Atomic Dynamics;Andra,1988
2. Probing surfaces with ions
3. Depth profiling using ultra-low-energy secondary ion mass spectrometry
4. Ultra shallow doping profiling with SIMS
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