Determination of trace element impurities in ultrapure reagents by total reflection X-ray spectrometry-Reference-Cited by-同舟云学术

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Determination of trace element impurities in ultrapure reagents by total reflection X-ray spectrometry

Published:1991-01 Issue:10 Volume:46 Page:1385-1393
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Prange Andreas,Kramer Karsten,Reus Ulrich

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference4 articles.

1. Semiconductor Equipment Manufactures Institute (SEMI), Specification for reagents, CI STD 21-85.

2. Ultra-trace analysis of metallic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF)

3. Inductively coupled plasma mass spectrometric analysis of ultrapure acids

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