Tin(ii) Hexafluoroacetylacetonate as a Precursor in Atmospheric Pressure Chemical Vapour Deposition: Synthesis, Structure and Properties
Author:
Publisher
Elsevier BV
Subject
General Chemistry
Reference19 articles.
1. Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD Precursors
2. The role of morphology and crystallographic structure of metal oxides in response of conductometric-type gas sensors
3. Aerosol-Assisted CVD of SnO2 Thin Films for Gas-Sensor Applications
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2. Main group metal coordination chemistry;Comprehensive Inorganic Chemistry III;2023
3. Formation of monomeric Sn(ii) and Sn(iv) perfluoropinacolate complexes and their characterization by 119Sn Mössbauer and 119Sn NMR spectroscopies;Dalton Transactions;2020
4. Tin trifluoroacetylacetonate [Sn(C5H4O2F3)2] as a precursor of tin dioxide in APCVD process;Russian Journal of Inorganic Chemistry;2016-05
5. Oxidative Additions of Homoleptic Tin(II) Amidinate;Organometallics;2015-01-28
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