Antimony implanted in silicon – A thin layer reference material for surface analysis-Reference-Cited by-同舟云学术

Antimony implanted in silicon – A thin layer reference material for surface analysis

Published:2001-04 Issue: Volume:175-177 Page:797-801
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Ecker K.H,Berger A,Grötzschel R,Persson L,Wätjen U

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference6 articles.

1. U. Wätjen, in: P. MisRaelides (Ed.), Application of Particle and Laser Beams in Materials Technology, Kluwer, Dordrecht, 1995, p. 477

2. Evaporated and implanted reference layers for calibration in surface analysis

3. D. De Soete, R. Gijbels, J. Hoste, Chemical Analysis, Vol. 34, Wiley-Interscience, London, 1972

4. The Stopping and Range of Ions in Solids;Ziegler,1985

5. J.R. Tesmer, M. Nastasi, J.C. Barbour, C.J. Maggiore, J.W. Mayer, (Eds.), Handbook of Modern Ion Beam Analysis, Materials Research Society, Pittsburgh, 1995

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