Characterization of metal-doped TiO2 films by RBS/channeling
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. RBS/channeling analysis of damage and annealing processes of Nb-implanted TiO2
2. Lattice site location and annealing behavior of W implanted TiO2
3. Ion implantation in TiO2: damage production and recovery, lattice site location and electrical conductivity
4. High-energy metal ion implantation into titanium dioxide films
5. Conductivity behaviour of Cr implanted TiO2
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2. Phase transformation comparison of TiO2 nanorods and TiO2 thin film after annealing;Electronic Materials Letters;2012-06
3. Modifications in structural and electronic properties of TiO2 thin films using swift heavy ion irradiation;Journal of Applied Physics;2011-10-15
4. Comparison of the phase transformation rate for TiO 2 thin film and TiO 2 nanorods;SPIE Proceedings;2010-03-25
5. Cause of Slow Phase Transformation of TiO2 Nanorods;The Journal of Physical Chemistry C;2009-10-23
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