Interface mixing in Ta/Si bilayers with Ar ions
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference16 articles.
1. Transition metal silicides in silicon technology
2. Growth kinetics of CoSi formed by ion beam irradiation at room temperature
3. Radiation induced effects in ion beam synthesis of erbium silicide
4. Kinetics of formation of silicides: A review
5. Model for compound formation during ion-beam mixing
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Restoration of the original depth distribution from experimental SIMS profile using the depth resolution function in framework of RMR model;Journal of Vacuum Science & Technology B;2023-03-01
2. Xenon-ion-induced and thermal mixing of Co/Si bilayers and their interplay;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2011-05
3. Ion beam induced surface and interface engineering;Surface Science Reports;2011-03
4. Low-energy Ar+ ion-beam induced vanadium silicide formation at V/Si interfaces;Thin Solid Films;2009-02
5. A channel for modification of materials with post-accelerated or decelerated multiply charged ion beams;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2008-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3