Molecular dynamics simulation of cluster beam Al deposition on Si ( 100 ) substrate
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference13 articles.
1. Ionized Cluster Beams: Physics and Technology
2. C. Sosa, in: Gas-Phase and Surface Chemistry in Electronic Materials Processing Symposium, 1995, p. 289
3. A molecular dynamics evidence for enhanced cluster beam epitaxy
4. Cluster simulation of Si and Al deposited layers on Si(100)-2×1 surface
5. Deposited microclusters and their interaction with substrate
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