Predicting residual stress of aluminum nitride thin-film by incorporating manifold learning and tree-based ensemble classifier

Author:

Chen Hsuan-FanORCID,Yang Yu-Pu,Chen Wei-Lun,Wang Peter J.,Lai Walter,Fuh Yiin-KuenORCID,Li Tomi T.

Funder

Delta Electronics Inc

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference53 articles.

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4. A systematic review of magnetron sputtering of AlN thin films for extreme condition sensing;Mwema;Mater. Today,2020

5. Machine learning assisted classification of aluminum nitride thin film stress via in-situ optical emission spectroscopy data;Yang;Materials,2021

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