High-accuracy simultaneous measurement of surface profile and film thickness using line-field white-light dispersive interferometer-Reference-Cited by-同舟云学术

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High-accuracy simultaneous measurement of surface profile and film thickness using line-field white-light dispersive interferometer

Published:2021-02 Issue: Volume:137 Page:106388
ISSN:0143-8166
Container-title:Optics and Lasers in Engineering
language:en
Short-container-title:Optics and Lasers in Engineering

Author:

Guo Tong,Zhao Guanhua,Tang Dawei,weng Qianwen,Sun Changbin,Gao Feng,Jiang Xiangqian

Funder

National Key Research and Development Program of China

111 Project Fund

UK Engineering and Physical Sciences Research Council

Future Advanced Metrology Hub

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Spectroscopic ellipsometry : principles and applications;Fujiwara,2007

2. Multiparameter measurements of thin films using beam-profile reflectometry;Fanton;J Appl Phys,1993

3. Spectroscopic ellipsometry and reflectometry: a user's guide;Harland,1999

4. High-speed noncontact profiler based on scanning white-light interferometry;Deck;Appl Opt,1994

5. A review of thickness measurements of thick transparent layers using optical interferometry;Park;Int J Precis Eng Manuf,2019

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2. Separation of fringe patterns in fast deflectometric measurement of transparent optical elements based on neural network-assisted fast iterative filtering method;Advances in Manufacturing;2024-07-04

3. Integrated form-position measurement of large-aperture transparent elements based on stereoscopic phase measuring deflectometry;Surface Topography: Metrology and Properties;2024-06-01

4. Super-resolution spectral interference fitting method for the simultaneous measurement of the thin film thickness and surface profile;Measurement Science and Technology;2024-04-10

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