Interpretation of anomalous layers at GaAs n+−n− step junctions

Author:

Blocker T.G.,Cox R.H.,Hasty T.E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,General Chemistry

Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A neutron damage study of liquid phase epitaxial GaAs and high purity silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-03

2. Chapter 10 Gallium Arsenide Radiation Detectors and Spectrometers;Semiconductors for Room Temperature Nuclear Detector Applications;1995

3. Schottky barrier height modification on high-purity LPE GaAs following a sulphur-based etch;Semiconductor Science and Technology;1993-07-01

4. Photoluminescence of thermally treated n+ Si-doped and semi-insulating Cr-doped GaAs substrates;Journal of Luminescence;1981-01

5. Removal of the high‐resistivity layer at thenonn+liquid phase epitaxial GaAs layer‐substrate interface by controlledinsituetch‐back;Journal of Applied Physics;1980-12

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