Advanced transparent conductive oxide electrode for optoelectronic thin-film devices-Reference-Cited by-同舟云学术

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Advanced transparent conductive oxide electrode for optoelectronic thin-film devices

Published:1990-10 Issue:1 Volume:76 Page:1-3
ISSN:0038-1098
Container-title:Solid State Communications
language:en
Short-container-title:Solid State Communications

Author:

Hoheisel M.,Heller S.,Mrotzek C.,Mitwalsky A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,General Chemistry

Reference12 articles.

1. Transparent conductors—A status review

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photodesorption and electron trapping in n-type SnO2thin films grown by dip-coating technique;Radiation Effects and Defects in Solids;1998-10

2. Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron Sputtering;Japanese Journal of Applied Physics;1998-04-15

3. On the homogeneity of sputter-deposited ITO films Part II. Etching behaviour;Thin Solid Films;1995-10

4. On the Mechanism of ITO Etching in Halogen Acids: The Influence of Oxidizing Agents;Journal of The Electrochemical Society;1995-07-01

5. Microstructure and etching properties of sputtered indium—tin oxide (ITO);Physica Status Solidi (a);1991-02-16

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