Characterization of the polymerization of SU-8 photoresist and its applications in micro-electro-mechanical systems (MEMS)

Author:

Zhang J.,Tan K.L.,Gong H.Q.

Publisher

Elsevier BV

Subject

Polymers and Plastics,Organic Chemistry

Reference16 articles.

1. Dendritic materials as a dry-release sacrificial layer;Suh;Journal of Microelectromechanical Systems,2000

2. Wenmin Qu, C. Wenzel, A. Jahn, D. Zeidler, UV–LIGA: a promising and low-cost variant for microsystem technology, in: Proceedings of Optoelectronic and Microelectronic Materials Devices, Perth, Australia, 1998, pp. 380–383.

3. Sacrificial layer process with laser-driven release for batch assembly operations;Holmes;Journal of Microelectromechanical Systems,1998

4. Ahn, Microfabricated toroidal planar inductors with different magnetic core schemes for MEMS and power electronic applications;Liakopoulos;IEEE Transactions on Magnetic,1999

5. N.C. Labianca, J.D. Gelorme, K.Y. Lee, E.O. Sullivan, J.M. Shaw, High aspect ratio optical resist chemistry for MEMS application, in: Proceedings of 4th International Symposium on Magnetic Materials, Processes and Devices, Chicago, 1993, pp. 386–396.

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