Fabrication of curved micro structures on photoresist layer
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Geotechnical Engineering and Engineering Geology,Condensed Matter Physics
Reference10 articles.
1. Fabrication of micromirrors with self-aligned metallization using silicon back-end-of-the-line processes [J];PONOTH;Thin Solid Films,2005
2. Sloping profile and pattern transfer to silicon by shape-controllable 3-D lithography and ICP [J];JEON;Sensors and Actuators A,2007
3. The optimization and characterization of ultra-thick photoresist films [J];FLACK;SPIE Proceedings Series,1998
4. Use of SU-8 photoresist for very high aspect ratio X-ray lithography [J];BOGDANOV;Microelectronic Engineering,2000
5. Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches [J];SAHA;Sensors and Actuators A,2008
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