In situ fixed angle X-ray reflectivity study of sputter-deposited amorphous LaNiO3 thin film on Si substrate
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference21 articles.
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1. Surface morphology of sputtered Ta2O5thin films on Si substrates from X-ray reflectivity at a fixed angle;Journal of Applied Crystallography;2008-03-08
2. The growth behavior and stress evolution of sputtering-deposited LaNiO3 thin films;Materials Science and Engineering: A;2008-02
3. Energy Deposition at the Substrate in a Magnetron Sputtering System;Reactive Sputter Deposition;2008
4. Real time investigation of the initial stages of a-C films growth;Diamond and Related Materials;2004-04
5. In-situ x-ray reflectivity measurement of the interface roughness of tantalum pentoxide thin film during rf magnetron sputtering deposition;SPIE Proceedings;2002-06-07
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