Epitaxial growth properties of Si and SiGe films prepared by ion beam sputtering process
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference7 articles.
1. Photoconductivity spectra for boron acceptors in Si1−xGex alloys
2. Electrical properties of heavily doped polycrystalline silicon-germanium films
3. Epitaxial growth of SiGe thin films by ion-beam sputtering
4. Sasaki K, Nagai H, Hata T., Proceedings of the fourth ISSP 1997; 483.
5. Enhancement of low‐temperature critical epitaxial thickness of Si(100) with ion beam sputtering
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Study on crystal growth of Ge/Si quantum dots at different Ge deposition by using magnetron sputtering technique;Scientific Reports;2023-05-09
2. Buffer-Free GeSn with High Relaxation Degree Grown on Si(001) Substrate for Photodetection;IEEE Photonics Journal;2018-12
3. Study of atomic arrangements and charge distribution on Si(0 0 1) surfaces with the adsorption of one Ge atom by DFTB calculations;Applied Surface Science;2018-07
4. Improving the growth of Ge/Si islands by modulating the spacing between screen and accelerator grids in ion beam sputtering deposition system;Applied Surface Science;2016-11
5. Secondary growth mechanism of SiGe islands deposited on a mixed-phase microcrystalline Si by ion beam co-sputtering;Nanotechnology;2015-10-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3