Carbon dots mediated charge sinking effect for boosting hydrogen evolution in Cu-In-Zn-S QDs/MoS2 photocatalysts
Author:
Publisher
Elsevier BV
Subject
Process Chemistry and Technology,General Environmental Science,Catalysis
Reference55 articles.
1. Highly efficient visible-light-driven photocatalytic hydrogen production of CdS-cluster-decorated graphene nanosheets;Li;J. Am. Chem. Soc.,2011
2. Current understanding and challenges of solar-driven hydrogen generation using polymeric photocatalysts;Wang;Nat. Energy,2019
3. Resorcinol-formaldehyde resins as metal-free semiconductor photocatalysts for solar-to-hydrogen peroxide energy conversion;Shiraishi;Nat. Mater.,2019
4. Noble metal-free hydrogen evolution catalysts for water splitting;Zou;Chem. Soc. Rev.,2015
5. Copper's rapid ascent in visible-light photoredox catalysis;Hossain;Science,2019
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