Implants of 15–50 MeV Boron ions into silicon-Reference-Cited by-同舟云学术

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Implants of 15–50 MeV Boron ions into silicon

Published:1989-02 Issue:1-3 Volume:2 Page:69-73
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

la Ferla A.,Di Franco A.,Rimini E.,Ciavola G.,Ferla G.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference14 articles.

1. Ion Implantation;Ryssel,1986

2. Megavolt arsenic implantation into silicon

3. 7th Int. Conf. on Ion Implantation Technology;La Ferla,1988

4. Semiconductor Processing;Faherner,1984

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