Recrystallization of boron-doped and undoped preamorphized silicon layers by rapid and conventional thermal annealing
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference21 articles.
1. Silicon preamorphization and shallow junction formation for ULSI circuits
2. Material and electrical properties of ultra-shallow p/sup +/-n junctions formed by low-energy ion implantation and rapid thermal annealing
3. Studies on the lattice position of boron in silicon†
4. The enhanced diffusion of boron in silicon after high-dose implantation and during rapid thermal annealing
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-resolution scanning near-field EBIC microscopy: Application to the characterisation of a shallow ion implanted p+–n silicon junction;Ultramicroscopy;2008-05
2. Fluorine-enhanced boron diffusion in germanium-preamorphized silicon;Journal of Applied Physics;2005-10
3. Enhanced Boron Diffusion in Amorphous Silicon;MRS Proceedings;2004
4. Electrically active defects in BF2+ implanted and germanium preamorphized silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1998-02
5. Boron Diffusion in Pre-Amorphised Silicon: Interactions with the End of Range Defects;Defect and Diffusion Forum;1997-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3