Investigation of amorphous-SiC thin film deposition by RF magnetron sputtering for optical applications-Reference-Cited by-同舟云学术

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Investigation of amorphous-SiC thin film deposition by RF magnetron sputtering for optical applications

Published:2024-11 Issue: Volume:182 Page:108673
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Chaussende Didier^ORCID,Tabouret Vincent,Crisci Alexandre,Morais Magali,Coindeau Stéphane,Berthomé Gregory,Kollmuss Manuel,Wellmann Peter,Jomard François,Pinault-Thaury Marie-Amandine,Lu Yaoqin,Shi Xiaodong,Ou Haiyan

Publisher

Elsevier BV

Reference37 articles.

1. Silicon carbide as a platform for power electronics;Eddy;Science,2009

2. 5 - silicon carbide;Chaussende,2019

3. Fundamentals of Silicon Carbide Technology: Growth, Characterization, Devices and Applications;Kimoto,2014

4. Novel photonic applications of silicon carbide;Ou;Materials,2023

5. Silicon carbide photonics bridging quantum technology;Castelletto;ACS Photonics,2022

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