Effects of deposition temperature on the structure and thermal stability of a-C:F films with low dielectric constant
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference14 articles.
1. Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasma
2. Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics
3. Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
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4. Investigation of Surface Layer Formation for Fluorinated Carbon Film Using Fourier Transform Infrared Spectrometry Analysis;Japanese Journal of Applied Physics;2008-08-08
5. Direct Triblock-Copolymer-Templating Synthesis of Highly Ordered Fluorinated Mesoporous Carbon;Chemistry of Materials;2007-10-31
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