Recent advances and challenges in the MOCVD growth of indium gallium nitride: A brief review

Author:

Tan A.K.,Hamzah N.A.,Ahmad M.A.,Ng S.S.,Hassan Z.

Funder

Universiti Sains Malaysia

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference134 articles.

1. Recent progress in group III-nitride nanostructures: from materials to applications;Chen;Mater. Sci. Eng. R Rep.,2020

2. Review—recent advances and challenges in indium gallium nitride (InxGa1-xN) materials for solid state lighting;Kour;ECS Journal of Solid State Science and Technology,2020

3. Thermal stability of indium nitride at elevated temperatures and nitrogen pressures;MacChesney;Mater. Res. Bull.,1970

4. Study of high quality indium nitride films grown on Si (100) substrate by RF-MOMBE with GZO and AlN buffer layers;Chen;J. Nanomater.,2012

5. Large-scale cubic InN nanocrystals by a combined solution and vapor-phase method under silica confinement;Chen;J. Am. Chem. Soc.,2012

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