Investigations of GaN growth on the sapphire substrate by MOCVD method with different AlN buffer deposition temperatures

Author:

Huang Wei-Ching,Chu Chung-Ming,Wong Yuen-Yee,Chen Kai-Wei,Lin Yen-Ku,Wu Chia-Hsun,Lee Wei-I,Chang Edward-Yi

Funder

Ministry of Science and Technology of Taiwan and TSMC

National Chung-Shan Institute of Science and Technology, Taiwan

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference32 articles.

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2. Very-high power density AlGaN/GaN HEMTs;Wu;IEEE Trans. Electron Devices,2001

3. D. Pavlidis, P. Valizadeh, S.H. Hsu, AlGaN/GaN High Electron Mobility Transistor (HEMT) reliability, in: Proceedings of the GAAS 2005: 13th European Gallium Arsenide and Other Compound Semiconductors Application Symposium, Conference, 2005, pp. 265–268.

4. Effect of OFF-state stress induced electric field on trapping in AlGaN/GaN high electron mobility transistors on Si (111);Anand;Appl. Phys. Lett.,2015

5. GaN growth using GaN buffer layer;Nakamura;Jpn. J. Appl. Phys.,1991

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