Author:
Chen Ming,Wang Ying,Zeng Aijun,Zhu Jing,Yang Baoxi,Huang Huijie
Funder
International Science & Technology Cooperation Programs of China
Science and Technology Commission of Shanghai Municipality
National Science and Technology Major Project of China
Subject
Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. H.J. Levinson, Principles of Lithography, 2nd ed., SPIE, 2005.
2. Design of illumination system for ArF excimer laser step-and-scanner;Lee;Proc. SPIE,1998
3. CANON KABUSHIKI KAISHA Tokyo, Method and Apparatus for Scanning Exposure, JP, U.S. Patent 4822975, 1989.
4. Carl Zeiss SMT Gmb H, Illumination system for microlithographic projection exposure apparatus, U.S. Patent 8004,656 B2, Aug 17, 2006.
5. Generation of trapezoidal illumination for the step-and-scan lithographic system;Chen;Appl. Opt.,2015
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