Sample preparation using plasma jet treatment for total reflection X-ray fluorescence analysis-Reference-Cited by-同舟云学术

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Sample preparation using plasma jet treatment for total reflection X-ray fluorescence analysis

Published:2024-07 Issue: Volume:217 Page:106972
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Tsuji Kouichi,Tanaka Yudai,Taniguchi Naoya,Oh Jun-Seok,Matsuyama Tsugufumi

Funder

Japan Society for the Promotion of Science

Ministry of Education, Culture, Sports, Science and Technology

Publisher

Elsevier BV

Reference17 articles.

1. Total-Reflection X-Ray Fluorescence Analysis and Related Methods;Klockenkamper,2015

2. Determination of the critical thickness and the sensitivity for thin-film analysis by total reflection X-ray fluorescence spectrometry;Klockenkamper;Spectrochim. Acta B,1989

3. X-ray standing waves and the critical sample thickness for Total-reflection X-ray fluorescence analysis;de Boer;Spectrochim. Acta B,1991

4. Experimental evidence of matrix effects in total-reflection X-ray fluorescence analysis: coke case;von Bohlen;Talanta,2020

5. TXRF intensity dependence on position of dried residue on sample carrier and TXRF determination of halogen in liquid samples;Tabuchi;X-Ray Spectrom.,2016

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