Adaptation of a commercial total reflection X-ray fluorescence system for wafer surface analysis equipped with a new generation of silicon drift detector-Reference-Cited by-同舟云学术

Adaptation of a commercial total reflection X-ray fluorescence system for wafer surface analysis equipped with a new generation of silicon drift detector

Published:2006-11 Issue:10-11 Volume:61 Page:1110-1114
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Pahlke Siegfried,Meirer Florian,Wobrauschek Peter,Streli Christina,Peter Westphal Georg,Mantler Claus

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference19 articles.

1. Handbook of Practical X-Ray Fluorescence Analysis: TXRF Wafer Analysis;Streli,2006

2. Quo Vadis total reflection X-ray fluorescence?;Pahlke;Spectrochim. Acta Part B,2003

3. www.cameca.com.

4. New Concepts of Silicon Drift Detectors and Electronic for Industrial Applications;Kemmer,2004

5. Analysis of background events in silicon drift detectors;Eggert;Nucl. Instrum. Methods,2003

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