A combined MW/ECR-PACVD apparatus for the deposition of diamond and other hard coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference9 articles.
1. Preparation of inorganic materials, surface treatment, and etching in low pressure plasmas: Present status and future trends
2. Plasma-assisted deposition techniques for hard coatings
3. Diamond and Diamond-like Films and Coatings;Angus,1991
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4. Surface characterisation of carbon films produced by plasma chemical vapour deposition method;Surface Engineering;2013-07
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