Gigatron® — a new source for low-pressure plasmas-Reference-Cited by-同舟云学术

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Gigatron® — a new source for low-pressure plasmas

Published:1995-09 Issue: Volume:74-75 Page:200-205
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Petasch W.,Räuchle E.,Weichart J.,Bickmann H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference6 articles.

1. Fundamentals of Plasma Chemistry and Technology;Boenig,1988

2. Plasma Polymerization;Yasuda,1985

3. Plasma Deposition, Treatment and Etching of Polymers;d'Agostino,1990

4. Microwave Excited Plasmas;Moisan,1992

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1. Distributed elementary ECR microwave plasma sources supplied by solid state generators for production of large area plasmas without scale limitation: plasma density measurements and comparison with simulation;Plasma Research Express;2021-06-01

2. On improved understanding of plasma-chemical processes in complex low-temperature plasmas;The European Physical Journal D;2018-05

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