Interfacial channel design on the charge migration for photoelectrochemical applications
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Published:2024-07
Issue:
Volume:
Page:100398
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ISSN:0254-5861
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Container-title:Chinese Journal of Structural Chemistry
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language:en
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Short-container-title:Chinese Journal of Structural Chemistry
Author:
Sun Shengdong,
Wang Cheng,
Li ShikuoORCID