Development and validation of a thermal simulation for the Czochralski crystal growth process using model experiments-Reference-Cited by-同舟云学术

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Development and validation of a thermal simulation for the Czochralski crystal growth process using model experiments

Published:2022-09 Issue: Volume:593 Page:126750
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Enders-Seidlitz A.,Pal J.,Dadzis K.

Funder

European Research Council

Horizon 2020 Framework Programme

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference136 articles.

1. Ein neues Verfahren zur Messung der Kristallisationsgeschwindigkeit der Metalle;Czochralski;Z. Phys. Chem.,1918

2. R.S. Feigelson, Crystal Growth through the Ages, in: Handb. Cryst. Growth, Elsevier, 2015: pp. 1–83. https://doi.org/10.1016/B978-0-444-56369-9.00001-0.

3. J. Friedrich, W. von Ammon, G. Müller, Czochralski Growth of Silicon Crystals, in: Handb. Cryst. Growth, Elsevier, 2015, pp. 45–104. https://doi.org/10.1016/B978-0-444-63303-3.00002-X.

4. Application of Artificial Neural Networks in Crystal Growth of Electronic and Opto-Electronic Materials;Dropka;Crystals,2020

5. Industry 4.0 – A Glimpse;Vaidya;Procedia Manuf.,2018

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3. A Coupled Approach to Compute the Dislocation Density Development during Czochralski Growth and Its Application to the Growth of High-Purity Germanium (HPGe);Crystals;2023-09-28

4. Three-dimensional modelling of 300 mm Czochralski silicon crystal growth with a transverse magnetic field;CrystEngComm;2023

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