Selective epitaxial growth of boron- and phosphorus-doped Si and SiGe for raised sources and drains
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference40 articles.
1. Properties and Silicon Germanium and SiGe:carbon,2000
2. The latest ITRS Roadmap, 2002, Available on http://public.itrs.net/.
3. Low parasitic resistance contacts for scaled ULSI devices
4. Enabling technologies for forming and contacting shallow junctions in Si: HF-vapor cleaning and selective epitaxial growth of Si and SiGe
5. Facet-Free Si Selective Epitaxial Growth Adaptable to Elevated Source/Drain MOSFETs with Narrow Shallow Trench Isolation
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