Hot-wall low pressure chemical vapor deposition growth and characterization of AlN thin films
Author:
Funder
NSF MRSEC program
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference22 articles.
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3. Chemical vapour deposition of polycrystalline AlN films from AlCl 3 Analysis and modelling of transport phenomena;Dollet;Thin Solid Films,2002
4. Structure and chemistry of the Si(111)/AlN interface;Radtke;Appl. Phys. Lett.,2012
5. Interfacial properties of AlN/Si (111) grown by metal-organic chemical vapour deposition;Xi;Chin. Phys. Lett.,2001
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