Effect of HCl addition on the crystalline fraction in silicon thin films prepared by hot-wire chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference30 articles.
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1. Low temperature deposition of polycrystalline silicon thin films on a flexible polymer substrate by hot wire chemical vapor deposition;Journal of Crystal Growth;2016-11
2. Non-Classical Crystallization of Thin Films and Nanostructures in CVD Process;Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices;2016-08-31
3. Bias Effect on Deposition Behaviour of Charged Nanoparticles;Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes;2016
4. Nonclassical Crystallization in Low-Temperature Deposition of Crystalline Silicon by Hot-Wire Chemical Vapor Deposition;Crystal Growth & Design;2014-11-10
5. Effect of HCl addition on the properties of p-type silicon thin films during hot-wire chemical vapor deposition;Renewable Energy;2013-06
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