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Rotatable serial co-sputtering of doped titania

  • Published:2015-04 Issue: Volume:114 Page:158-161
  • ISSN:0042-207X
  • Container-title:Vacuum
  • language:en
  • Short-container-title:Vacuum

Author:

Sittinger V.,Pflug A.,Dewald W.,Jung S.,Britze C.,Kaiser A.,Werner W.,Szyszka B.,Bräuer G.

Funder

Federal Ministry for the Environment, Nature Conservation and Nuclear Safety BMU

EU-FP7 Project ‘ORAMA’

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference9 articles.

1. Serial cosputtering of some metal alloys: enhancement of partial sputtering yields of light metals;Belkind;J Vac Sci Technol A,1993

2. Serial cosputtering of metals: modelling of sputtering from a periodically codeposited surface;Carlsson;Surf Coatings Technol,1993

3. Atom assisted sputtering yield amplification;Berg;J Vac Sci Technol A,1992

4. Recent developments in the field of transparent conductive oxide films for spectral selective coatings, electronics and photovoltaics;Szyszka;Curr Appl Phys,2012

5. Magnetic roller gas gate employing transonic sweep gas flow to isolate regions of differing gaseous composition or pressure;Doehler,1994
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