Modelling of plasma etching process using radial basis function network and genetic algorithm
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference30 articles.
1. A comparison of statistically-based and neural network models of plasma etch behavior
2. Advantages of plasma etch modeling using neural networks over statistical techniques
3. Use of neural networks in modeling semiconductor manufacturing processes: an example for plasma etch modeling
4. Constructing a reliable neural network model for a plasma etching process using limited experimental data
5. An optimal neural network process model for plasma etching
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