The effects of O2/Ar ratio on the structure and properties of hafnium dioxide (HfO2) films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference11 articles.
1. Laser damage dependence on structural and optical properties of ion-assisted HfO2 thin films
2. Characterisation of HfO2 deposited by photo-induced chemical vapour deposition
3. Microstructure and characteristics of the HfO2 dielectric layers grown by metalorganic molecular beam epitaxy
4. Microstructure and interfaces of HfO2 thin films grown on silicon substrates
5. Structural modifications of hafnium oxide films prepared by ion beam assisted deposition under high energy oxygen irradiation
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1. Modulation of microstructure and optical properties of anti-reflection HfO2 films by sputtering power and O2/Ar flow ratio;Applied Physics B;2023-10-11
2. Facilitating the formation of SnO2 film via HfO2-modified FTO electrode for efficient perovskite solar cells;Applied Physics Letters;2023-06-05
3. Effect of oxygen flow on the optical properties of hafnium oxide thin films by dual-ion beam sputtering deposition;Applied Physics A;2022-11-21
4. High strength, low thermal conductivity and collapsible of Y2O3-stablized HfO2 crystalline fibrous membranes;Ceramics International;2022-06
5. Study of the structure, roughness and optical properties of HfO2 coatings deposited on microscopic glass substrates;Journal of Physics: Conference Series;2022-03-01
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