Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference29 articles.
1. Kohlenstoff-haltige tern�re Phasen (Nb3Al2C und Ta3Al2C)
2. Alloy phases crystallizing with structures which occur with non-metallic compounds
3. Gasphasenabscheidung im system TiSiC
4. Chemically vapor deposited Ti3SiC2
5. Synthesis and Characterization of a Remarkable Ceramic: Ti3SiC2
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