High-power impulse magnetron sputter deposition of TiBx thin films: Effects of pulse length and peak current density-Reference-Cited by-同舟云学术

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High-power impulse magnetron sputter deposition of TiBx thin films: Effects of pulse length and peak current density

Published:2024-04 Issue: Volume:222 Page:113070
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Hellgren Niklas^ORCID,Zhirkov Igor,Sortica Mauricio A.^ORCID,Petruhins Andrejs,Greczynski Grzegorz,Hultman Lars^ORCID,Rosen Johanna

Funder

Knut and Alice Wallenberg Foundation

Publisher

Elsevier BV

Reference46 articles.

1. Review of transition-metal diboride thin films;Magnuson;Vacuum,2022

2. Nanohardness and tribological properties of nc-TiB2 coatings;Lofaj;J. Eur. Ceram. Soc.,2013

3. The influence of low-energy ion bombardment on the microstructure development and mechanical properties of TiBx coatings;Mikula;Vacuum,2011

4. Microstructure and materials properties of understoichiometric TiBx thin films grown by HiPIMS;Thörnberg;Surf. Coating. Technol.,2020

5. Improved oxidation properties from a reduced B content in sputter-deposited TiBx thin films;Thörnberg;Surf. Coating. Technol.,2021

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tribological Properties of Hard TiB2 Thin Films Prepared at Low Temperatures Using HiPIMS;Coatings;2024-04-16

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