Study of the neutral gas flow on discharges of capacitively coupled plasma in a PECVD reactor
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference24 articles.
1. Microcrystalline silicon thin-film solar cells prepared at low temperature using PECVD
2. Comprehensive study of microcrystalline silicon solar cells deposited at high rate using 13.56 MHz plasma-enhanced chemical vapor deposition
3. Plasma-enhanced chemically vapour-deposited silicon dioxide for metal/oxide/semiconductor structures on InSb
4. Effect of PECVD silicon oxynitride film composition on the surface passivation of silicon wafers
5. Thin film silicon materials and solar cells grown by pulsed PECVD technique
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