The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system

Published:2012-07 Issue:12 Volume:86 Page:2152-2157
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Woo Jong-Chang,Chun Yoon-Soo,Joo Young-Hee,Kim Chang-II

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference23 articles.

1. Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition

2. Switching properties of thin Nio films

3. Reproducible switching effect in thin oxide films for memory applications

4. Resistive switching in metal–ferroelectric–metal junctions

5. Impedance spectroscopy of TiO2 thin films showing resistive switching

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Etching for Vertical Sidewall Formation in TiO₂ Nanorods;Applied Science and Convergence Technology;2022-09-30

2. Low loss TiO2 channel waveguides;Integrated Optics: Devices, Materials, and Technologies XXIV;2020-02-25

3. Photocatalytic activity of nanostructured titania coatings on aluminum substrates;Inorganic Materials;2017-10-01

4. Fabrication of high aspect ratio TiO2 and Al2O3 nanogratings by atomic layer deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-05

5. Surface Etching of TiO2Thin Films Using High Density Cl2/Ar Plasma;Transactions on Electrical and Electronic Materials;2015-12-25

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP