Corrigendum to “Fluorine-doped SiO2 and CF low-k dielectrics obtained during RIE process in fluorine plasmas” [Vacuum 82 (2008) 1040–1045]
Author:
Kalisz Malgorzata,Beck R.B.,C´wil M.
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation