Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon-Reference-Cited by-同舟云学术

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Hydrogen redistribution and enhanced thermal donor formation at post implantation annealing of p-type hydrogen implanted Czochralski silicon

Published:1999-02 Issue:1-2 Volume:58 Page:91-94
ISSN:0921-5107
Container-title:Materials Science and Engineering: B
language:en
Short-container-title:Materials Science and Engineering: B

Author:

Ulyashin A.G.,Ivanov A.I.,Khorunzhii I.A.,Job R.,Fahrner W.R.,Komarov F.F.,Kamyshan A.C.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference12 articles.

1. Enhanced thermal donor formation in silicon exposed to a hydrogen plasma

2. Enhanced thermal donor formation and oxygen diffusion in silicon exposed to a hydrogen plasma

3. Hydrogen diffusion and the catalysis of enhanced oxygen diffusion in silicon at temperatures below 500 °C

4. Hydrogen‐accelerated thermal donor formation in Czochralski silicon

5. Hydrogen introduction and hydrogen‐enhanced thermal donor formation in silicon

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. What Do We Know about Hydrogen-Induced Thermal Donors in Silicon?;Journal of The Electrochemical Society;2009

2. Radiation Defects and Thermal Donors Introduced in Silicon by Hydrogen and Helium Implantation and Subsequent Annealing;Solid State Phenomena;2007-10

3. Local lifetime control in silicon power diode by ion irradiation: introduction and stability of shallow donors;IET Circuits, Devices & Systems;2007

4. Hydrogen enhanced thermal donor formation in p-type Czochralski silicon: application to low temperature active defect-engineering;Physica B: Condensed Matter;2001-12

5. Properties of silicon-on-insulator structures and devices;Semiconductors;2001-09

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