Halogenated silanes, radicals, and cations: Theoretical predictions on ionization energies, structures and potential energy surfaces of cations, proton affinities, and enthalpies of formation-Reference-Cited by-同舟云学术

Halogenated silanes, radicals, and cations: Theoretical predictions on ionization energies, structures and potential energy surfaces of cations, proton affinities, and enthalpies of formation

Published:2008-09 Issue:1 Volume:276 Page:56-76
ISSN:1387-3806
Container-title:International Journal of Mass Spectrometry
language:en
Short-container-title:International Journal of Mass Spectrometry

Author:

Wang Liming,He Yi-Liang

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Instrumentation

Reference111 articles.

1. Surface Analysis of Atomic-Layer-Etched Silicon by Chlorine

2. Mass spectroscopic measuring of SiCln (n = 0–2) radicals in SiCl4 RF glow discharge plasma

3. Identification of halogen containing radicals in silicon etching plasmas and density measurement by UV broad band absorption spectroscopy

4. Production and loss mechanisms of SiClX etch products during silicon etching in a high density HBr∕Cl2∕O2 plasma

5. Substrate temperature effects on surface reactivity of SiFx (x=1, 2) radicals in fluorosilane plasmas

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2. Cooperative Effect of Noncovalent Interactions on Tetrel Bonding in Halogenated Silanes;ChemPhysChem;2022-02

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