Ion beam induced epitaxy experiments in silicon under channeling and random alignments
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. Ion-beam-induced epitaxial regrowth of amorphous layers in silicon on sapphire
2. Proportionality between ion-beam-induced epitaxial regrowth in silicon and nuclear energy deposition
3. Dominant Influence of Beam-Induced Interface Rearrangement on Solid-Phase Epitaxial Crystallization of Amorphous Silicon
4. Kinetics, Microstructure And Mechanisms of Ion Beam Induced Epitaxial Crystallization of Semiconductors.
5. Ion-beam-induced crystallization and amorphization of silicon
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1. Damage Formation, Amorphization and Crystallization in Semiconductors at Elevated Temperatures;Ion Beam Modification of Solids;2016
2. The effects of swift heavy-ion irradiation on helium-ion-implanted silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-10
3. Control of the azimuthal orientation of grains in polycrystalline Si films;AIP Advances;2012-06
4. Impact of fluence-rate related effects on the sputtering of silicon at elevated target temperatures;Journal of Applied Physics;2009-02-15
5. Ion-Beam-Induced Amorphization and Epitaxial Crystallization of Silicon;Topics in Applied Physics;2009
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