PIV measurements for flow pattern and void fraction in cavitating flows of He II and He I
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Materials Science
Reference12 articles.
1. Developmental history of liquid oxygen Turbopumps for the LE-7 engine;Kamijo;Trans Jpn Soc Aeronaut Space Sci,2001
2. Cavitation in flowing supperfluid helium;Daney;Cryogenics,1988
3. Behavior of turbine and Venturi flowmeters in superfluid helium;Daney;Adv Cryo Eng,1988
4. Cavitation characteristics of a small centrifugal pump in He I and He II;Ludtke;Cryogenics,1988
5. Numerical simulation of cavitation flow of liquid Helium in Venturi channel;Ishimoto;Cryogenics,2003
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